| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming an optical thin film, which prevents the deterioration of the optical properties by hindering plasma which is used when a high refractive index layer is formed by using an assist method from etching a low refractive index layer, and to provide an optical element provided with the optical thin film. SOLUTION: A dielectric multilayer film having an Nb<SB>2</SB>O<SB>5</SB>/MgF<SB>2</SB>/Al<SB>2</SB>O<SB>3</SB>structure has an Al<SB>2</SB>O<SB>3</SB>layer of an oxidized substance formed in between the low refractive index layer formed of MgF<SB>2</SB>and the high refractive index layer formed of Nb<SB>2</SB>O<SB>5</SB>on an optical substrate, with the use of a vacuum vapor-deposition method. The Al<SB>2</SB>O<SB>3</SB>layer functions as a barrier layer to prevent the plasma which is used when the Nb<SB>2</SB>O<SB>5</SB>layer is formed by using the ion-assist method from etching the MgF<SB>2</SB>layer. The optical element having the dielectric multilayer film formed therein is used, for instance, as a polarized beam splitter corresponding to a blue semiconductor laser with a wavelength of 405 nm in an optical pickup. COPYRIGHT: (C)2009,JPO&INPIT
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