LAYER DEPOSITION APPARATUS AND METHOD OF OPERATING LAYER DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a layer deposition apparatus capable of reducing pre-reaction of a process gas.

SOLUTION: The layer deposition apparatus is provided with a chamber (10) having a process gas room (11) which is provided with a substrate carrier (12) for receiving at least one substrate (13) to be coated and a partition wall (23). The partition wall (23) partitions the first segment (21) of the process gas room (11) from the second segment (22) of the process gas room (11), and a device (44) is installed for bringing the substrate (13) into relative motion with respect to the partition wall (23).

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