Combined Electrostatic Lens System for Ion Implantation

摘要

A system and method are provided for implanting ions at low energies into a workpiece. An ion source configured to generate an ion beam is provided, wherein a mass resolving magnet is configured to mass resolve the ion beam. The ion beam may be a ribbon beam or a scanned spot ion beam. A mass resolving aperture positioned downstream of the mass resolving magnet filters undesirable species from the ion beam. A combined electrostatic lens system is positioned downstream of the mass analyzer, wherein a path of the ion beam is deflected and contaminants are generally filtered out of the ion beam, while concurrently decelerating and parallelizing the ion beam. A workpiece scanning system is further positioned downstream of the combined electrostatic lens system, and is configured to selectively translate a workpiece in one or more directions through the ion beam, therein implanting ions into the workpiece.

主权项

1. An ion implantation system, comprising:
an ion source and extraction assembly configured to generate an ion beam; a mass-analysis magnet assembly configured to mass resolve the ion beam; a mass resolving aperture positioned downstream of the mass-analysis magnet assembly, wherein the mass resolving aperture is configured to filter undesirable species from the ion beam, and wherein the ion beam generally diverges after passing through the mass resolving aperture; a combined electrostatic lens system positioned downstream of the mass-analysis magnet assembly, wherein a path of the ion beam is deflected and contaminants are generally filtered out of the ion beam, while concurrently decelerating and parallelizing the ion beam; and a workpiece holder and translation system positioned downstream of the combined electrostatic lens system and configured to selectively translate a workpiece in one or more directions through the ion beam.