SUBSTRATE HOLDER AND SUPPORT TABLE FOR LITHOGRAPHY

摘要

A substrate table (WT) supports a substrate holder (WH) to which a substrate (W) is clamped for exposure. The substrate table (WT) has a plurality of e-pins (30) spaced apart from and distributed around the center of the substrate holder for receiving and lowering a substrate onto the substrate holder prior to exposure and raising a substrate off the substrate holder after exposure. Tip portions of the e-pins (30) and the corresponding apertures (24) in the substrate holder (WH) have a shape in plan including at least one re-entrant, e.g. a cross shape.

主权项

1. A substrate table system, comprising:
a substrate holder having:
an upper surface,a plurality of burls located on and distributed across the upper surface, the burls being configured to support a substrate thereon, anda plurality of apertures in the substrate holder, the apertures being spaced apart from the center of the substrate holder; a plurality of spaced apart e-pins, each e-pin having a tip portion at a distal end thereof; an actuator system configured to control a projection of each e-pin into and/or through the respective apertures in the substrate holder, wherein at least one of the apertures has a shape at the upper surface of the substrate holder that includes at least one re-entrant, wherein the cross-section of the tip portion of at least one of the e-pins in a plane parallel to the upper surface of the substrate holder has a shape corresponding to the shape of the at least one aperture that includes the at least one re-entrant, and wherein at least one burl is located within the at least one re-entrant.