| 摘要 |
PROBLEM TO BE SOLVED: To solve such a problem that high cost is required for the deposition of a passivation film. SOLUTION: A CVD apparatus is provided with: a susceptor 2 stored inside a treatment vessel 1 and having a mounting face to be mounted with the body 3 to be treated; a gas feeding means 4 for feeding a gaseous starting material to the upper space of the mounting face of the susceptor 2; a filament 5 arranged on the space between the feeding position of the gaseous starting material and the susceptor 2; a heating means for heating the filament 5; a heat insulation board 6 arranged on the side of the susceptor 2 in the filament 5; and an exhausting means 9 for exhausting the inside of the treatment vessel 1. COPYRIGHT: (C)2005,JPO&NCIPI
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