发明名称 Semiconductor device
摘要 A semiconductor device includes a semiconductor substrate, a channel layer, a Schottky layer, a first layer having a narrower band gap than the Schottky layer, a second layer having band discontinuity with the Schottky layer, a gate electrode, an n+ layer, a source electrode, and a drain electrode. The first and second layers are within the Schottky layer, and the second layer is disposed on the first layer.
申请公布号 US2005167698(A1) 申请公布日期 2005.08.04
申请号 US20050078361 申请日期 2005.03.14
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 HISAKA TAKAYUKI
分类号 H01L29/812;H01L21/338;H01L29/08;H01L29/10;H01L29/739;H01L29/778;H01L31/0328;H01L31/0336;H01L31/072;H01L31/109;(IPC1-7):H01L29/739 主分类号 H01L29/812
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