| 摘要 |
The invention relates to a method for exposing a three-dimensional region (1), wherein the three-dimensional region is divided into at least two successive layers (2) which are exposed in chronological order, wherein each layer (2) is divided into at least two exposure fields (3) having at least a first part-region (4), a second part-region (4'), optionally a third part-region (4''), and optionally further part-regions, wherein adjacent exposure fields (3) overlap in individual part-regions (4', 4'' prevent) in order to avoid incorrectly exposed areas. |
