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发明名称
Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und Substrathalter
摘要
申请公布号
DE60315403(D1)
申请公布日期
2007.09.20
申请号
DE20036015403
申请日期
2003.12.19
申请人
ASML NETHERLANDS B.V.
发明人
VAN BALLEGOIJ, ROBERTUS N. J.;CUIJPERS, MARTINUS A. W.;MEIJERS, PIETER J. G.;VAN NUNEN, GERARDUS P. M.;OTTENS, JOOST J.
分类号
G03F7/20;H01L21/683;H01L21/027
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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