| 摘要 |
PROBLEM TO BE SOLVED: To provide a cluster type vapor deposition apparatus that shortens the overall length of process facilities for manufacturing an organic light-emitting element.SOLUTION: A vapor deposition apparatus comprises a loading chamber, a transport chamber 21, and a plurality of clusters 20 connected to a process chamber 22 for vapor deposition and a buffer chamber 24 for transporting and rotating a substrate P, and the process chamber 22 comprises substrate support bases 221a, b supporting substrates P provided on both sides respectively, and a vapor deposition source 222 provided on a floor surface and moving reciprocally in a region below the substrate support bases 221a, b. A transfer unit 25 comprises: a substrate holder 251; an articulated link 252 for forward/backward movement which has a front end part 252a connected to the substrate holder 251; and a rotary link 253 which has one end part 253a connected to the center of the transport chamber 21 and the other end part 253b connected to a rear end part 252b of the articulated link 252, and is arranged in a transfer line for substrates orthogonal to a moving direction of the vapor deposition source 222 from the front end part 252a and rear end part 252b of the articulated link 252 and the front center of the substrate support bases.SELECTED DRAWING: Figure 6 |
