| 摘要 |
PROBLEM TO BE SOLVED: To inhibit adhesion of a process liquid to a non-treatment surface of a substrate.SOLUTION: A substrate processing apparatus comprises: a holding member for holding a substrate on the lower side in a substantially horizontal way; and an opposite member including a body part opposite to a top face of the substrate across a clearance, and an extension part extending from at least a part of a periphery of the body part to a side of the holding member. The substrate processing apparatus comprises: a projection provided at one portion out of a tip side portion of the extension part and a lateral face portion of the holding member; and a regulation structure arranged on the other portion and from back and forth of a circumferential direction centered at a rotational axis and opposite to the projection, for regulating relative movement of the projection in the circumferential direction. Relative movement of the holding member and the opposite member in the circumferential direction is regulated, and the substrate processing apparatus further comprises: a rotation mechanism for rotating at least one of the holding member and the opposite member around the rotational axis; and a nozzle for discharging a process liquid to a treatment surface of the substrate, in which the projection and the regulation structure are arranged below a top face of the holding member.SELECTED DRAWING: Figure 6 |
