| 摘要 |
PROBLEM TO BE SOLVED: To achieve improvement in image quality and in auto-focus speed, in a solid-state imaging element that has two photodiodes arranged in a predetermined direction in each pixel and that is formed by performing division exposure in which the whole chip is processed by a plurality of times of exposure.SOLUTION: A first exposure region IG1 having a first region 1A and a second exposure region IG2 having a second region 2A are overlapped in a third region 3A provided between the first region 1A and the second region 2A. In a pixel PE3 formed in the third region 3A, a photodiode PD2 formed by a mask for the first exposure region IG1 is arranged at a position closer to the second region 2A side, compared with a photodiode PD3 formed by a mask for the second exposure region IG2.SELECTED DRAWING: Figure 2 |
