| 摘要 |
PROBLEM TO BE SOLVED: To provide a salt and a resin to be used for a resist composition, and a resist composition, from which a resist pattern can be produced with good line edge roughness.SOLUTION: The salt is represented by formula (I); and the resin and the resist composition comprise a structural unit derived from the salt of formula (I). In the formula, Qand Qeach independently represent a fluorine atom or a perfluoroalkyl group; Rand Reach independently represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; Xrepresents *-CO-O-, *-O-CO- or *-O-, where * represents a bonding site to C(R)(R) or C(Q)(Q); Arepresents a hydrocarbon group having a divalent alicyclic hydrocarbon group; Arepresents a divalent hydrocarbon group; Rand Reach independently represent a hydrogen atom or a monovalent saturated hydrocarbon group; Rrepresents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; and Zrepresents an organic cation.SELECTED DRAWING: None |
