发明名称 CONTINUOUS HOT-DIP METAL PLATING METHOD AND CONTINUOUS HOT-DIP METAL PLATING APPARATUS
摘要 A continuous hot-dip metal plating method is provided with which it is possible to inhibit both non-plating attributable to metal vapor generated inside the snout and non-plating attributable to an oxide film on the molten-metal-bath surface inside the snout and to stably and rapidly change the oxidizing ability of the atmosphere inside the snout. The continuous hot-dip metal plating method according to the present invention is characterized by supplying an oxidizing gas to the inside of a snout 14, regulating the temperature of the inner wall of the snout to a temperature not lower than (plating bath temperature)-150°C, and regulating the temperature of the upper atmosphere inside the snout to a temperature not lower than (plating bath temperature)-100°C.
申请公布号 WO2016170720(A1) 申请公布日期 2016.10.27
申请号 WO2016JP01013 申请日期 2016.02.25
申请人 JFE STEEL CORPORATION 发明人 TAKAHASHI, Hideyuki
分类号 C23C2/00;C21D9/46;C21D9/56;C23C2/06;C23C2/40 主分类号 C23C2/00
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