发明名称 ODLING AV MONOKRISTALLINT SKIKT
摘要 An apertured mask layer is disposed on a substrate having a monocrystalline portion at a surface thereof. Essentially all edges of the mask apertures are parallel to a predetermined crystallographic direction. A monocrystalline layer is then deposited such that it grows within the mask apertures and over the mask in a direction perpendicular to the aperture edges.
申请公布号 SE8301028(D0) 申请公布日期 1983.02.24
申请号 SE19830001028 申请日期 1983.02.24
申请人 RCA CORPORATION 发明人 J T * MCGINN;L L * JASTRZEBSKI;J F * CORBOY JR
分类号 H01L27/12;C30B25/18;H01L21/02;H01L21/20;H01L21/263;H01L21/86 主分类号 H01L27/12
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