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经营范围
发明名称
Photoresist copolymer.
摘要
申请公布号
DE69931201(T2)
申请公布日期
2006.08.31
申请号
DE19996031201T
申请日期
1999.05.20
申请人
DAICEL CHEMICAL INDUSTRIES, LTD.
发明人
NAKANO, TATSUYA
分类号
C08F220/18;C07C69/00;C07C69/54;C08F220/30;G03F7/004;G03F7/039
主分类号
C08F220/18
代理机构
代理人
主权项
地址
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