| 摘要 |
A method for manufacturing a card (102) based on a substrate (101), the method comprising a step of defining the perimeter of the card (102) within the substrate (101), the method also comprising a step of chamfering on a portion of the perimeter of the card (102) so that on completion of the perimeter definition and chamfering steps the physical dimensions of the card (102) are compliant with the parameters A, Ai, B, Bj, C2, C3, and Rm defined by that Micro SD card standard designated V3.00, wherein: i=1, 6 . . . 8; j=1, 4, 10, 11, x, y (the pair [x,y] being equal to [6,9] or to [14,15]); and m=1 . . . 6, 17 . . . 19, the physical dimensions of the card (102) also being compliant with the parameter A9 of the standard when x=6 and y=9. |
