发明名称 |
Phase change random access memory device, method of fabricating the same, and method of operating the same |
摘要 |
Provided are a phase change random access memory (PRAM), a method of fabricating the PRAM, and a method of operating the PRAM. The PRAM may include a gate electrode configured to temporarily increase an electrical resistance of the lower electrode contact layer if a voltage is applied to the gate electrode, and around the lower electrode contact layer between a switching device and a phase change layer. A spacer insulating layer is disposed between the lower electrode contact layer and the gate electrode.
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申请公布号 |
US2010019220(A1) |
申请公布日期 |
2010.01.28 |
申请号 |
US20090458758 |
申请日期 |
2009.07.22 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SUH DONG-SEOK |
分类号 |
H01L45/00 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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