发明名称 Phase change random access memory device, method of fabricating the same, and method of operating the same
摘要 Provided are a phase change random access memory (PRAM), a method of fabricating the PRAM, and a method of operating the PRAM. The PRAM may include a gate electrode configured to temporarily increase an electrical resistance of the lower electrode contact layer if a voltage is applied to the gate electrode, and around the lower electrode contact layer between a switching device and a phase change layer. A spacer insulating layer is disposed between the lower electrode contact layer and the gate electrode.
申请公布号 US2010019220(A1) 申请公布日期 2010.01.28
申请号 US20090458758 申请日期 2009.07.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SUH DONG-SEOK
分类号 H01L45/00 主分类号 H01L45/00
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