发明名称 SURFACE TREATMENT METHOD OF PROBE, AND PROBE
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment method of a probe capable of preventing impurities or gas from being included in a metal layer formed on a contact end of the probe, and improving denseness of the metal layer and adhesiveness of the metal layer to the contact end. SOLUTION: A plurality of probes 10 are aligned so that each contact face of the contact end 11 is faced to the same direction, and sputtering is performed to each contact end 11 of the plurality of probes 10 in this state from a direction opposite to each contact face of the contact end 11, to thereby form a plating layer 12 on each contact end 11 of the plurality of probes 10. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008045916(A) 申请公布日期 2008.02.28
申请号 JP20060219821 申请日期 2006.08.11
申请人 JAPAN ELECTRONIC MATERIALS CORP 发明人 MITSUNE ATSUSHI;HAN TOSHIFUMI
分类号 G01R1/067 主分类号 G01R1/067
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