| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming apparatus which can prevent increase of chamber volume and shorten a production tact time in spite of a very simple configuration.SOLUTION: A film forming apparatus includes a shutter 51 which can move up and down between an abutting position of covering a target material 22 by abutting on a sputtering electrode 23 and a retreat position in the vicinity of a bottom of a chamber 10. The shutter 51 moves up from the retreat position to the abutting position by drive of an air cylinder 53 in a state of being supported from below by a cylinder rod 54 of the air cylinder 53. The shutter 51 is supported at the abutting position by slide pins at cylinder rod tips of air cylinders 61 fixed to a body 11 of the chamber 10 by L-shaped metal fittings 18. |
