Novel copolymers and photoresist compositions comprising copolymer resin binder component
摘要
The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.
申请公布号
EP1669803(A2)
申请公布日期
2006.06.14
申请号
EP20060004466
申请日期
1997.05.28
申请人
ROHM AND HAAS ELECTRONIC MATERIALS LLC
发明人
BARCLAY, GEORGE G.;CRONIN, MICHAEL F.;DELLAGUARDIA, RONALD A.;THACKERAY, JAMES W.;ITO, HIROSHI;BREYTA, GREG