发明名称 |
THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
<p>Disclosed are a highly sensitive photopolymerization initiator composition having excellent storage stability, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound suitable for the photopolymerization initiator composition. Specifically disclosed is a thiourethane compound having 2-6 units each containing a moiety represented by the formula (i) below and a moiety represented by the formula (ii) below. (i) (ii) (In the formulae, R<SUB>1</SUB> represents a hydrogen atom or a methyl group; and R<SUB>2</SUB> represents -CO-, -COO- or -COOR<SUB>3</SUB>- (wherein R<SUB>3</SUB> represents an alkylene group having 2-6 carbon atoms).)</p> |
申请公布号 |
WO2008023603(A1) |
申请公布日期 |
2008.02.28 |
申请号 |
WO2007JP65836 |
申请日期 |
2007.08.14 |
申请人 |
SHOWA DENKO K.K.;IKEDA, HARUHIKO;MIYATA, HIDEO;HATTORI, YOTARO;MUROFUSHI, KATSUMI |
发明人 |
IKEDA, HARUHIKO;MIYATA, HIDEO;HATTORI, YOTARO;MUROFUSHI, KATSUMI |
分类号 |
C08F20/38;C07C333/04;C07C333/08;C07C333/10;C08F2/50;G02B5/20;G03F7/004;G03F7/027 |
主分类号 |
C08F20/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|