发明名称 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>Disclosed are a highly sensitive photopolymerization initiator composition having excellent storage stability, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound suitable for the photopolymerization initiator composition. Specifically disclosed is a thiourethane compound having 2-6 units each containing a moiety represented by the formula (i) below and a moiety represented by the formula (ii) below. (i) (ii) (In the formulae, R<SUB>1</SUB> represents a hydrogen atom or a methyl group; and R<SUB>2</SUB> represents -CO-, -COO- or -COOR<SUB>3</SUB>- (wherein R<SUB>3</SUB> represents an alkylene group having 2-6 carbon atoms).)</p>
申请公布号 WO2008023603(A1) 申请公布日期 2008.02.28
申请号 WO2007JP65836 申请日期 2007.08.14
申请人 SHOWA DENKO K.K.;IKEDA, HARUHIKO;MIYATA, HIDEO;HATTORI, YOTARO;MUROFUSHI, KATSUMI 发明人 IKEDA, HARUHIKO;MIYATA, HIDEO;HATTORI, YOTARO;MUROFUSHI, KATSUMI
分类号 C08F20/38;C07C333/04;C07C333/08;C07C333/10;C08F2/50;G02B5/20;G03F7/004;G03F7/027 主分类号 C08F20/38
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