发明名称 CATALYST LAYER FORMING METHOD, CATALYST LAYER FORMING SYSTEM AND RECORDING MEDIUM
摘要 A catalyst adsorbed on a surface of a substrate is fixed to the substrate without leaving a residue in a concave portion of the substrate. A catalyst layer forming method comprises: forming a catalyst layer (22) by adsorbing a catalyst (22A) on a surface of a substrate and on an inner surface of a concave portion by supplying a catalyst solution (32) to the substrate (2) having the concave portion (2a); rinsing the surface of the substrate (2) and the inner surface of the concave portion (2a) with a rinsing solution; and drying the surface of the substrate (2) and the inner surface of the concave portion (2a). By a fixing agent solution (34) including a fixing agent to the substrate (2), the catalyst (22A) on the surface of the substrate (2) is fixed to the substrate (2) by the fixing agent (22B).
申请公布号 KR20160102895(A) 申请公布日期 2016.08.31
申请号 KR20160019192 申请日期 2016.02.18
申请人 TOKYO ELECTRON LIMITED 发明人 INATOMI YUICHIRO;TANAKA TAKASHI;MIZUTANI NOBUTAKA;SAITO YUSUKE;IWAI KAZUTOSHI;IWASHITA MITSUAKI
分类号 H01L21/02;H01L21/208 主分类号 H01L21/02
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