发明名称 |
CATALYST LAYER FORMING METHOD, CATALYST LAYER FORMING SYSTEM AND RECORDING MEDIUM |
摘要 |
A catalyst adsorbed on a surface of a substrate is fixed to the substrate without leaving a residue in a concave portion of the substrate. A catalyst layer forming method comprises: forming a catalyst layer (22) by adsorbing a catalyst (22A) on a surface of a substrate and on an inner surface of a concave portion by supplying a catalyst solution (32) to the substrate (2) having the concave portion (2a); rinsing the surface of the substrate (2) and the inner surface of the concave portion (2a) with a rinsing solution; and drying the surface of the substrate (2) and the inner surface of the concave portion (2a). By a fixing agent solution (34) including a fixing agent to the substrate (2), the catalyst (22A) on the surface of the substrate (2) is fixed to the substrate (2) by the fixing agent (22B). |
申请公布号 |
KR20160102895(A) |
申请公布日期 |
2016.08.31 |
申请号 |
KR20160019192 |
申请日期 |
2016.02.18 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
INATOMI YUICHIRO;TANAKA TAKASHI;MIZUTANI NOBUTAKA;SAITO YUSUKE;IWAI KAZUTOSHI;IWASHITA MITSUAKI |
分类号 |
H01L21/02;H01L21/208 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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