| 主权项 |
1. A reverse conducting semiconductor device, comprising:
a semiconductor substrate of a first conduction type having a first major surface and a second major surface; gate electrodes formed in a plurality of trenches provided in stripe form in the first major surface, with a gate oxide film interposed between the gate electrodes and the trenches; a transistor having an emitter layer formed on the first major surface side, a base layer of a second conduction type formed below the emitter layer and bordering the gate oxide film, and a collector layer of the second conduction type formed on the second major surface side; a diode having an anode layer of the second conduction type formed on the first major surface side, a high-concentration anode layer of the second conduction type formed on the first major surface side and having an impurity concentration higher than that in the anode layer, and a cathode layer of the first conduction type formed on the second major surface side, the diode being formed horizontally adjacent to the transistor; an interlayer film formed on the first major surface and having through grooves extending parallel to the gate electrodes, the through grooves not overlapping the gate electrodes in a vertical direction; a barrier metal layer formed in the through grooves so as to contact the anode layer and the high-concentration anode layer; tungsten plugs abutting the barrier metal layer and filling the through grooves; and an emitter electrode abutting the tungsten plugs, wherein the width of the high-concentration anode layer is larger than the width of contact of the barrier metal layer with the high-concentration anode layer wherein a recurring unit in a pattern of the anode layer and the high-concentration anode layer is an anode cell, and wherein the area S1 of contact between the high-concentration anode layer and the barrier metal layer per each of anode cells, is smaller than the area S2 of contact between the anode layer and the barrier metal layer per anode cell. |
