| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for magnetic recording medium film formation capable of suppressing generation of particles as well as forming a film with a low ordering temperature, and also provide a method of manufacturing the same.SOLUTION: A sputtering target for magnetic recording medium film formation comprises a sintered body having a composition represented by the general formula:{(FePt)In}C, where 30≤x≤80, 1≤y≤20 and 3≤z≤65 with atom ratios. A method of manufacturing the sputtering target includes a step of hot pressing of a mixed powder of an InPt alloy powder, a FePt alloy powder, a Pt powder, and a graphite powder or carbon black powder, in a vacuum or inert gas atmosphere. |
