| 发明名称 |
Lithographic Method and Apparatus |
| 摘要 |
A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system. |
| 申请公布号 |
US2016274462(A1) |
申请公布日期 |
2016.09.22 |
| 申请号 |
US201415032245 |
申请日期 |
2014.10.02 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BORGES NICOLAU Jaqueline;NOBLE Hannah;BASELMANS Johannes Jacobus Matheus;SMEETS Bart;VAN ADRICHEM Paulus Jacobus Maria |
| 分类号 |
G03F7/20;G06T5/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of correcting an optical image formed by an optical system, the method comprising:
obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system; combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map; and using the image map to correct an optical image formed by directing the input radiation beam through the optical system. |
| 地址 |
Veldhoven NL |
