发明名称 |
METHOD OF OBSERVING SAMPLE USING ELECTRON BEAM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of repeatedly observing the bottom of a contact hole having a high aspect ratio. SOLUTION: The electrostatic charge potentials in a pattern to be observed and the periphery of an observation range are stabilized by pre-charging with stepwise changing the irradiation range of an electron beam. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008096342(A) |
申请公布日期 |
2008.04.24 |
申请号 |
JP20060279920 |
申请日期 |
2006.10.13 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
KOJIMA TAKEKI;IWAMA SATORU;IKEGAMI AKIRA |
分类号 |
G01N23/225;H01L21/66 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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