发明名称 METHOD OF OBSERVING SAMPLE USING ELECTRON BEAM
摘要 PROBLEM TO BE SOLVED: To provide a method of repeatedly observing the bottom of a contact hole having a high aspect ratio. SOLUTION: The electrostatic charge potentials in a pattern to be observed and the periphery of an observation range are stabilized by pre-charging with stepwise changing the irradiation range of an electron beam. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008096342(A) 申请公布日期 2008.04.24
申请号 JP20060279920 申请日期 2006.10.13
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KOJIMA TAKEKI;IWAMA SATORU;IKEGAMI AKIRA
分类号 G01N23/225;H01L21/66 主分类号 G01N23/225
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