发明名称 |
METHOD AND DEVICE FOR PRODUCING A THREE-DIMENSIONAL OBJECT AND EXPOSURE MASK GENERATING APPARATUS |
摘要 |
The invention relates to a method for producing a three-dimensional object by layer by layer solidifying of a material which is solidifiable under the action of radiation, making use of exposure masks, wherein in order to form each object layer to be solidified of the object in a construction plane, there is generated at least one, preferably a single, digital exposure mask by means of which the radiation is selectively projected into the construction plane, wherein for each exposure mask, according to the object layer to be solidified, a single 2-bit bitmap is calculated which assigns either the bit-value “transparent” or the bit-value “non-transparent” to each pixel of the exposure mask. In addition, an improved exposure mask generating apparatus and an improved device for producing a three-dimensional object are proposed. |
申请公布号 |
US2016221267(A1) |
申请公布日期 |
2016.08.04 |
申请号 |
US201614994427 |
申请日期 |
2016.01.13 |
申请人 |
Schultheiss GmbH |
发明人 |
John Hendrik;Schultheiss Andreas |
分类号 |
B29C67/00 |
主分类号 |
B29C67/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. Method for producing a three-dimensional object by layer by layer solidifying of a material which is solidifiable under the action of radiation, making use of exposure masks, wherein in order to form each object layer to be solidified of the object in a construction plane, there is generated at least one, preferably a single, digital exposure mask by means of which the radiation is selectively projected into the construction plane, wherein for each exposure mask, according to the object layer to be solidified, a single 2-bit bitmap is calculated which assigns either the bit-value “transparent” or the bit-value “non-transparent” to each pixel of the exposure mask, wherein the bit-value “transparent” is assigned to at least one surface region of the 2-bit bitmap having a structure size below a limit structure size and wherein an exposure texture is assigned to each surface region above the limit structure size, said exposure texture being configured in the form of a pattern of pixels with the bit-values “transparent” and “non-transparent”. |
地址 |
Heimsheim DE |