发明名称 PHOTORESIST COATER FOR UNIFORMLY COATING PHOTORESIST ON SUBSTRATE
摘要 PURPOSE: A photoresist coater is provided to uniformly coat photoresist on a substrate and easily control the thickness of the photoresist coated on the substrate. CONSTITUTION: A photoresist coater includes a photoresist coating unit for coating photoresist on a substrate. The photoresist coating unit includes a main body(10) and a nozzle part(50). The main body has a photoresist container for containing photoresist. The nozzle part includes a plurality of nozzle holes(51) connected to the photoresist container to spray the photoresist. Each of the nozzle holes has a diameter of 1.5 to 50 micrometer.
申请公布号 KR20050018688(A) 申请公布日期 2005.02.24
申请号 KR20030054905 申请日期 2003.08.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KANG, SUNG CHUL;KIM, SEONG BONG;LEE, DUCK JUNG;LEE, JUNG HO;NAM, HYO RAK
分类号 G02F1/13;(IPC1-7):G02F1/13 主分类号 G02F1/13
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