| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent or reduce the occurrence of residual liquid on the substrate and/or substrate table after the exposure of a substrate, in an immersion type lithographic apparatus. <P>SOLUTION: In immersion lithography, after the exposure of a substrate is completed, a detector is used for detecting residual liquid that remains on the substrate and/or substrate table. <P>COPYRIGHT: (C)2009,JPO&INPIT |
