| 发明名称 |
PLASMA NITRIDING APPARATUS |
| 摘要 |
A plasma nitriding apparatus includes: a surface treatment unit which includes a treatment tank to house part of a treatment object inclusive of a surface treatment region, and performs a nitriding treatment on the surface treatment region inside of the treatment tank by using plasma of a treatment gas; and an outer container which receives supply of the treatment gas, and houses the treatment object and the treatment tank so that a region of the treatment object other than the part is exposed from the treatment tank. |
| 申请公布号 |
US2016281207(A1) |
申请公布日期 |
2016.09.29 |
| 申请号 |
US201615172507 |
申请日期 |
2016.06.03 |
| 申请人 |
IHI Corporation |
发明人 |
KAMEYA Norimitsu;FUCHIGAMI Kenji |
| 分类号 |
C23C8/36;C23C8/04;H01J37/32 |
主分类号 |
C23C8/36 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A plasma nitriding apparatus comprising:
a surface treatment unit including a treatment tank to house part of a treatment object inclusive of a surface treatment region, and configured to perform a nitriding treatment on the surface treatment region inside of the treatment tank by using plasma of a treatment gas; and an outer container configured to receive supply of the treatment gas, and to house the treatment object and the treatment tank so that a region of the treatment object other than the part is exposed from the treatment tank. |
| 地址 |
Koto-ku JP |
