发明名称 USE OF AN AMORPHOUS ALLOY OF SILICON AND GERMANIUM AS AGAINST GALLIUM-ARSENIDE LASER RADIATION SENSITIVE PHOTOCONDUCTOR
摘要 <p>An improved photoconductor for GaAs laser addressed devices sensitive to illumination at about 1.5 eV is an amorphous material containing silicon, hydrogen and a material taken from the group consisting of Ge, Sn and Pb. A preferred embodiment of this invention is amorphous SixGe1-xHy where x equals 0.78 to 0.93 and y equals 14-20 atomic percent.</p>
申请公布号 EP0003237(B1) 申请公布日期 1983.05.18
申请号 EP19780101834 申请日期 1978.12.23
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHEVALLIER, JACQUES PAUL;GUARNIERI, CHARLES RICHARD;ONTON, AARE;WIEDER, HAROLD
分类号 G03G5/08;H01L31/0248;H01L31/0376;H01L31/09;H01L31/20;H01S5/00;(IPC1-7):01L31/02;22C29/00 主分类号 G03G5/08
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