SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

摘要

A technical idea of the present invention provides a semiconductor device with excellent operation performance, and a manufacturing method thereof. The semiconductor device comprises: a semiconductor substrate; at least one first gate structure with a flat upper surface formed on the semiconductor substrate, extended in a first direction, and having a first width in a direction perpendicular to the first direction; and at least one second gate structure with a convex upper surface formed on the semiconductor substrate, extended in a second direction, and having a second width greater than the first width in a direction perpendicular to the second direction.