发明名称 Lithographic photosensitive material
摘要 A lithographic photosensitive material which comprises a support having thereon at least one silver halide emulsion layer and that, contains as a lithographic development accelerating agent a compound represented by the following general formula (I) in its silver halide emulsion layer or another hydrophilic colloidal layer: <IMAGE> (I) wherein R1 to R5 may be the same or different, and they each represent hydrogen, a halogen atom, an alkyl group, an alkoxy group, an aryl group, <IMAGE> (wherein R6 and R7 each represents hydrogen or an alkyl group, or they may combine with each other to form a 5- or 6-membered nitrogen containing saturated hetero ring), -NH-CO-R8 or -NHSO2-R9 (wherein R8 and R9 each represents an alkyl group, an aryl group or an aralkyl group), or R3 and R4, or R4 and R5 may combine with each other to form a benzene ring and that, it is necessary to said compound that at least one of substituents R1, R3 and R5 represents -NHSO2-R9, or the benzene ring formed by combining R3 and R4, or by combining R4 with R5 is substituted with at least one -NHSO2-R9 group.
申请公布号 US4510229(A) 申请公布日期 1985.04.09
申请号 US19840591227 申请日期 1984.03.19
申请人 FUJI PHOTO FILM CO., LTD. 发明人 OKA, YUTAKA;SAEKI, NAOMI;FUSEYA, YOSHIHARU
分类号 G03C5/29;G03C1/06;G03C1/10;(IPC1-7):G03C1/06;G03C5/24;G03C1/02 主分类号 G03C5/29
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