FORMATION OF VAPOR-DEPOSITED FILM AND EVAPORATING SOURCE

摘要

PURPOSE:To reduce a change in the chemical composition of a vapor-deposited film by making the depth of a vessel contg. a material to be evaporated specified times the width of the evaporating surface of the vessel so s to reduce a change in the chemical composition of vapor generated from an evaporating source. CONSTITUTION:A stainless steel vessel 23 contg. a material 25 to be evaporated is placed in the outer wall 21 of a knudsen cell type evaporating source 20, and heaters 24 are placed above and below the vessel 23. The material 25 is melted and evaporated by heating with the heaters 24, and the resulting vapor is deposited on the surface of a rotating drum-shaped substrate 26 positioned above an opening 22 on the top of the outer wall 21 through the opening 22. The depth d1 of the vessel 23 is made >=3 times the width w1 of the evaporating surface of the vessel 23.