发明名称 METHOD AND APPARATUS FOR MEASURING PHOTOELASTICITY
摘要 PURPOSE:To enable the measurement of photoelasticity of a non-transparent, by irradiating the non-transparent body with a specified wavelength of near infrared rays to detect the near infrared rays with a light receiving section as transmitted through the non-transparent body. CONSTITUTION:A measuring apparatus is made up a light source 2 comprising a halogen lamp for projecting near infrared rays with the wavelength lambda of 1.2-2.5mum, a spectroscope 4 having a grating 3, a polarizer 6, a 1/4 wavelength plate 7, a lens 8, a photodetector element 10, a vidicon camera 11, an amplifier 12 and a TV monitor 13. Then, for example, a measuring sample 9 comprising an injection molding of ABS resin is set between lenses 8' and 8'', near infrared rays with the wavelength lambda of 2.0mum are picked out with a spectroscope 4 to be linearly polarized with the polarizer 6 and circularly polarized with the 1/4 wavelength plate and then, the rays are made parallel with the lens 8 to irradiate the sample 9. The near infrared rays transmitted through the sample 9 received and detected with the vidicon camera 11 and inputted into the TV camera 13 via the amplifier 12. Thus, an equal inclination line can be obtained about the freezing stress of the sample 9.
申请公布号 JPS61253436(A) 申请公布日期 1986.11.11
申请号 JP19850093647 申请日期 1985.05.02
申请人 HITACHI LTD 发明人 YOSHII MASAKI;KANEDA AIZO
分类号 G01B11/16;G01L1/00 主分类号 G01B11/16
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