| 摘要 |
PURPOSE:To prevent an Al2O3 surface from being corroded by the contact with pure water in the stage of cleaning the Al2O3 formed by sputtering, etc., with the pure water by adding a material such as CO2 which dissociates in the pure water and forms O atoms into the pure water. CONSTITUTION:The pure water is supplied by a supply pipe 12 from a pure water producing apparatus 13 into a cleaning tank 11 in the stage of cleaning the Al2O3 film formed by sputtering as a structural material to be used for a thin film magnetic head, etc. The Al2O3 film is cleaned in the pure water 14 while gaseous CO2 is supplied into the pure water 14 from a gaseous CO2 cylinder 9. CO2 dissociates in the pure water to generate the O atoms. The Al2O3 film in the deficient oxygen state is converted to the stable Al2O3 by the O by which the efficient cleaning of the Al2O3 film is made possible without generating corrosive resulted product such as Al2O(OH)2.
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