发明名称 |
FOCUSED PHOTON ENERGY HEATING CHAMBER |
摘要 |
An apparatus and method for heating substrates, such as semiconductor wafers. A radiation energy source is arranged proximate to a reflector to direct radiation towards a window providing optical access to a processing chamber. A lens positioned outside of the window focuses the radiation emitted from the radiation energy source and reflector and directs it through the window. The focused radiation energy can be used to directly or indirectly heat a semiconductor wafer disposed in the processing chamber. |
申请公布号 |
WO2005052988(A2) |
申请公布日期 |
2005.06.09 |
申请号 |
WO2004US29642 |
申请日期 |
2004.09.08 |
申请人 |
WAFERMASTERS, INC.;YOO, WOO, SIK |
发明人 |
YOO, WOO, SIK |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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