| 摘要 |
A process for improving the abrasion resistance of vapor deposited metal layers which comprises vapor depositing a metal layer on at least one surface of a substrate and, before subjecting the metal layer to physical treatment or contact which would abrade the metal layer, vapor depositing onto said metal layer 1) a 1 to 600 nm layer of organic material having a vapor pressure at 20 DEG C equal to or less than that of 1-n-octanol said material having a) a carbonyl group not part of a carboxyl group, b) a phenoxy group, c) an ester group, or d) an alcohol group, or 2) a layer of organic material having a thickness of at least 1 nm and less than 30 nm and a) a carboxyl group, b) a saccharide, c) Rhodamine B, or d) phthalocyanine. The organic materials can improve the properties of the metal layer when used in photoresist imaging films. |
