| 摘要 |
PURPOSE:To prevent evaporation of components of a substrate protection plate and deterioration of the protection plate so as to enable it to be reused, by covering the substrate protection plate with a protection plate cover simultaneously with moving a slider for starting growth of crystals, for the purpose preventing the substrate protection plate from being contacted directly with high temperature gas. CONSTITUTION:In a liquid-phase epitaxy apparatus, a substrate 3 to be treated and a protection plate cover 5 of carbon are carried on a boat 1 of carbon, and a slider 2 is disposed thereon. A substrate protection plate 4 and growing melt 6 are inserted through holes formed in the slider 2. When inserted, the protection plate 4 is supported by a projection provided on the inner wall bottom and placed over the substrate 3. After the protection plate 4 and the growing melt 6 are put in the holes of the slider 2, they are covered by a cover of carbon so as to prevent evaporation of component elements thereof and deterioration of the protection plate 4.
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