| 摘要 |
PURPOSE:To reduce the consumption of chemicals, particularly, the consumption of chemicals at the time of untreating, by mounting a chemical recovery device into a chemical vapor path on the outside of a chemical tank regarding a semiconductor production unit. CONSTITUTION:A condensing mechanism 5 with several cooling water paths 4 is set up along the inner wall of the tank in the upper section of the tank, thus cooling and condensing the vapor of chemicals excessively generated, then directly recovering chemicals again. An exhaust port 6 is formed to the upper section of the condensing mechanism 5, and an atmosphere including the vapor of residual chemicals is discharged from the exhaust port 6. An exhaust system condensing mechanism 8 for recovering the vapor of chemicals, which cannot be recovered completely by the condensing mechanism 5 in the chemical tank, is mounted on its midway of an exhaust duct 7, and chemicals condensed in the mechanism 8 are recovered into the chemical tank through a chemical recovery path 9. The exhaust system condensing mechanism 8 is constituted by a cooling water path 10 in the same manner as the condensing mechanism 5 in the chemical tank.
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