发明名称 METHOD FOR ETCHING ELECTRICALLY CONDUCTIVE FILM CONTAINING METALLIC ELEMENT
摘要 PURPOSE:To form a fine line pattern with improved accuracy and to prolong the service life of an etching soln. by liberating a metal from an electrically conductive film in a first stage, dissolving the metal in a second stage and using a soln. contg. a metallic salt which makes the metal soluble by ionization in the second stage. CONSTITUTION:An electrically conductive film contg. a metallic element is etched in two stages. In the first stage, the metal is partially liberated from the film by reduction with a first etching soln. In the second stage, the liberated metal is dissolved and removed with a second etching soln. contg. a metallic salt which makes the metal soluble by ionization. By this method, the metallic salt can be consumed only to dissolve the liberated metal even in case of continuous treatment, the service life of the second etching soln. can be prolonged and the dimensional accuracy of fine lines on a substrate can be improved.
申请公布号 JPS63230888(A) 申请公布日期 1988.09.27
申请号 JP19870063673 申请日期 1987.03.20
申请人 TAIYO YUDEN CO LTD 发明人 KATO MITSUAKI;FUKAI KIKUJI
分类号 C23F1/30;C09K13/04;G02F1/13;H01B5/14;H01L21/308 主分类号 C23F1/30
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