| 摘要 |
PURPOSE:To enable the fine working of the titled material with a direct light by introducing acetoxyphenyl, formyloxyphenyl or halogenoacetoxy phenyl group into a polyimide, thereby enabling to utilize a phototransitional reaction. CONSTITUTION:The titled material is composed of a polymer having a repeating unit shown by formula I wherein R1 is a divalent group, R2 is a tetravalent group having one or more aromatic rings, R3 is a group shown by formula II or III, R4 is 1-3C alkylene group, R5-R8 are each H or methyl group, (m) is 1-3, (n) is 1-4, (l) is an integer. Said polymer is formed by for example, polycondensating a halide derivative of dicarboxylic acid obtd. from a tetracarboxylic acid dianhydride and a diamine. And, the titled material is formed by applying the solution of said polymer on a substrate, followed by precuring the polymer solution to form a film. A fine pattern is formed by mounting the mask having a prescribed pattern on the obtd. film, and then by irradiating a light on the mask, developing, followed by allowing to carry out the imide formation of the mask by heating. |
