发明名称 CHIP INTERCONNECT WITH HIGH DENSITY OF VIAS
摘要 2074529 9111833 PCTABS00006 A solder interconnection for forming vias between first and second substrates (12, 14) comprises a plurality of solder containing wells (16) extending into a flat surface (18) of the first substrate (12), the solder (20) in each well (16) being soldered to one of a corresponding plurality of conductor posts (22) extending outwardly from a flat surface (23) of the second substrate (14). The plurality of the wells (16) are created in a pattern, an aliquot of solder (20) is deposited in each well (16), with the aliquot being of substantially no greater volume than that of the well (16) it occupies, the posts (22) are provided in aligned array with the pattern, the solder (20) is melted, the posts (22) are inserted and the solder (20) solidifies. Very closely placed vias can be formed.
申请公布号 CA2074529(A1) 申请公布日期 1991.07.27
申请号 CA19912074529 申请日期 1991.01.17
申请人 COMMTECH INTERNATIONAL 发明人 MADOU, MARC J.;GAISFORD, SCOTT
分类号 H01L21/98;H01L23/48;H01L23/498;H05K3/34;(IPC1-7):H01L23/50 主分类号 H01L21/98
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