| 摘要 |
PURPOSE:To impart superior physical performance, such as resistance to chemicals, to a residual film by incorporating a specified polymer and a specified photopolymerization initiator. CONSTITUTION:The resist composition contains (a) 20 - 90wt.% of the polymer having repeating branched groups instable against acid, (b) 10 - 70wt.% of the polymer having groups reacting by heating with the decomposition products of the acid-instable groups of (a), and (c) the photopolymerization initiator to be allowed to produce an acid by light irradiation in an amount of 0.1 - 50wt.% of the total weight of (a) and (b), thus permitting the obtained resist composition to have superior sensitivity and to be used for both of positive and negative type resists high in resolution and the residual film to have superior physical performance, such as resistance to chemicals. |
