| 摘要 |
PURPOSE:To expose by increasing the intensity of SOR light by a method wherein, in an exposing device utilyzing an SOR light device, the SOR light is magnified uniformly in vertical direction. CONSTITUTION:A downward-facing oblique incidence plane mirror and another oblique incidence plane mirrors 41 and 42, which are opposing with each other, are arranged in the light lead-out line of a SOR light device. These oblique incidence plane mirrors 34, 41 and 42 reflect the center part and both side parts of the SOR light 29, and the reflected lights are superposingly projected on the position of the same height on a wafer 33. The irradiation light is scanned in vertical direction on the wafer 33 in the state wherein the SOR light 29 is superposed by swingingly moving the oblique incidence plane mirrors 34, 41 and 42, and the whole surface of the wafer 33 is exposed. |
