发明名称 |
Semiconductor device process using diffusant penetration and source layers for shallow regions |
摘要 |
A semiconductor device is formed by a process in which a diffusant penetration layer and a diffusant source layer containing a boron dopant are formed overlaying the surface of a semiconductor substrate. The diffusant source layer is annealed to cause the boron dopant to controllably diffuse through the diffusant penetration layer to the semiconductor substrate to form a doped region at the surface. The diffusant source layer and the diffusant penetration layer are removed and a gate insulator is formed on the substrate surface overlaying the doped region. An N doped gate electrode is then formed overlaying the gate insulator.
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申请公布号 |
US5141895(A) |
申请公布日期 |
1992.08.25 |
申请号 |
US19910640458 |
申请日期 |
1991.01.11 |
申请人 |
MOTOROLA, INC. |
发明人 |
PFIESTER, JAMES R.;KIRSCH, HOWARD C. |
分类号 |
H01L21/225;H01L21/28;H01L29/51 |
主分类号 |
H01L21/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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