发明名称 |
METHOD FOR APPROXIMATING NUMBER OF PARTICLES ON PATTERNED REGION OF WAFER SURFACE AND PRECISE INSPECTING DEVICE FOR SURFACE |
摘要 |
PURPOSE: To provide a method and an apparatus for determining the number of contaminant material particles in a patterned circuit region on a semiconductor wafer. CONSTITUTION: A diffraction grating pattern is formed in same mode simultaneously with formation of a reflection circuit pattern on a wafer 10. The wafer is scanned by means of a laser beam 23 and since a diffraction pattern to be generated by a grating pattern is known, it can be detected when and which grating pattern is being scanned by the light beam. Scattering light from a non-grating region is separated spatially from the diffracted light from the grating and only the light scattered from a particle or a defect existing in the grating region is collected and detected by a photodetector 44. Number of particles in the grating region is calculated from a detected scattering light and the number of particles in the circuit pattern region is estimated by extrapolation. Alternatively, a stripped region may be inspected precisely. |
申请公布号 |
JPH04305951(A) |
申请公布日期 |
1992.10.28 |
申请号 |
JP19910127677 |
申请日期 |
1991.05.30 |
申请人 |
TENCOR INSTR |
发明人 |
AAMAN PII NIYUUKAAMANZU;PIITAA SHII JIYAN;RARUFU UORUFU;DEIBITSUDO UORUZE;SUTANREE SUTOKOBUSUKI |
分类号 |
H01L21/66;G01N21/94;H01L21/027 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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