发明名称 |
LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD |
摘要 |
Provided is a lithography apparatus that includes a plurality of patterning devices each of which is configured to perform patterning for a substrate supplied from a preprocessing apparatus; and a controller configured to control the plurality of patterning devices such that a plurality of substrates respectively belonging to a plurality of lots is subjected to parallel processings by the plurality of patterning devices based on a plurality of recipe information respectively corresponding to the plurality of lots, and transmit information regarding a schedule of the parallel processings to the preprocessing apparatus. |
申请公布号 |
US2016334714(A1) |
申请公布日期 |
2016.11.17 |
申请号 |
US201615221985 |
申请日期 |
2016.07.28 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Koga Shinichiro;Takakura Noburu;Kawamura Akihiko |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
Tokyo JP |