| 摘要 |
<p>PURPOSE:To enable an electrostatic chuck to have an enough suction force in a high-temperature environment by a method wherein a voltage is applied to the electrode of the electrostatic chuck so as to make a suction object positive in polarity. CONSTITUTION:When an electrostatic chuck 7 is installed in a processing tank 8 of a substrate processing device, an electrode 3 is installed in the processing tank 8 as insulated, and the surface of the electrode 3 is coated with an alumina insulating material 2. A contact terminal 6 is provided adjacent to the electrode 3 to apply a voltage to a substrate 1 and energized upwards by a spring to come into contact with the substrate 1 which is electrostatically sucked. The positive electrode and the negative electrode of a direct current power supply 4 are connected to the wiring of the contact terminal 6 airtightly led outside of the tank 8 and the wiring of the electrode 3 respectively. Furthermore, a heater 5 is provided under the electrode 3 to heat the substrate 1 up to a temperature of 200 deg.C or above as prescribed. As mentioned above, the positive electrode of a direct current power supply is connected to the substrate 1, whereby the substrate 1 can be held on the suction plane 2a of the electrode 3 with an enough suction force.</p> |
