| 摘要 |
PURPOSE:To obtain a highly reliable jet recording head by a method wherein a resist pattern which is patterned excellently in dimentional precision is formed by carrying out exposure and development processing at least two times in patterning a posi-type photoresist. CONSTITUTION:A posi-type photoresist 2 is formed on a substrate to be processed 1, and a pattern is exposed thereon via a nozzle pattern mask 3. Thereafter, it is developed, processed by rinsing, treated by post-baking, and a first resist pattern 7 is obtained. Then, after exposing the pattern on the resist pattern 7 by use of the same mask 3, it is processed by rinsing, treated by post-baking, and a second resist pattern 8 is obtained. Then, the resist pattern 8 is coated with a photosetting liquid passage forming material, and the passage forming material is hardened by exposing all surfaces. Then, the substrate to be processed 1 is dipped into sodium hydroxide solution, and the resist pattern 8 is removed by dissolving. Thus, a liquid jet recording head having a highly reliable micro-nozzle will be capable of being manufactured. |
